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dc.contributor.authorWako, Ali Halake
dc.contributor.authorDejene, F. B.
dc.contributor.authorSwart, H.C.
dc.date.accessioned2016-09-26T13:44:40Z
dc.date.available2016-09-26T13:44:40Z
dc.date.issued2015-09
dc.identifier.citationPhysica B 480 (2016) 116–124en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.physb.2015.09.049
dc.identifier.urihttp://hdl.handle.net/123456789/939
dc.descriptionThe authors acknowledge with immense gratitude the South African National Laser Centre (NLC) and the Council for Scientific and Industrial Research (CSIR) for assisting with the PLD technique for film ablation and deposition and also for technical, financial and logistical support during research visits to the NLC labs. This work is based on the research supported by the South African Research Chairs Initiative (Grant no. 84415) of the Department of Science and Technology, and the National Research Foundation of South Africa and University of the Free State Cluster Fund.en_US
dc.description.abstractThin films of Eu2þ doped and Dy3þ,Nd3þ co-doped Strontium Aluminate (SrAl2O4:Eu2þ,Dy3þ,Nd3þ) phosphors were grown on Si(100) substrates by a pulsed laser deposition (PLD) technique using a 266 nm Nd:YAG pulsed laser under varying substrate temperature and the working atmosphere during the film deposition process. The effect of substrate temperatures and argon partial pressure on the structure and luminescence properties of the as-deposited SrAl2O4:Eu2þ,Dy3þ,Nd3þ phosphor thin films were analysed. XRD patterns showed that with increasing substrate temperature and argon partial pressure the peaks in the direction (220) shifted to the lower 2-theta angles. Photoluminescence (PL) data collected in air at room temperature revealed a slight shift in the peak wavelength of the PL spectra observed from the thin films when compared to the PL spectra of the phosphor in powder form, which is probably due to a change in the crystal field. The PL intensity of the samples was highest for 100 °C substrate temperature and 20 mTorr argon partial pressure. Due to this, the effect of argon partial pressure was studied at a constant substrate temperature of 100 °C while the effect of Substrate temperatures recorded at 20 mTorr argon pressure respectively.en_US
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.subjectSolution-combustionen_US
dc.subjectSrAl2O4:Eu2+en_US
dc.subjectThin filmsen_US
dc.subjectSr/Al mol%en_US
dc.subjectArgon Photoluminescenceen_US
dc.titleStructural and luminescence properties of SrAl2O4:Eu2+,Dy3+,Nd3+ phosphor thin films grown by pulsed laser depositionen_US
dc.typeArticleen_US


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